Material Development for Silsesquioxane Containing Block Copolymer Lithography
نویسندگان
چکیده
منابع مشابه
Scanning probe block copolymer lithography.
Integration of individual nanoparticles into desired spatial arrangements over large areas is a prerequisite for exploiting their unique electrical, optical, and chemical properties. However, positioning single sub-10-nm nanoparticles in a specific location individually on a substrate remains challenging. Herein we have developed a unique approach, termed scanning probe block copolymer lithogra...
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The prolonged and aggressive nature of scaling to augment the performance of silicon integrated circuits (ICs) and the technical challenges and costs associated with this has led to the study of alternative materials that can use processing schemes analogous to semiconductor manufacturing. We examine the status of recent efforts to develop active device elements using nontraditional lithography...
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The design, preparation, and properties of planar multilayer structures composed of various combinations of sequentially deposited polyelectrolyte (PE) chains and self-assembled layers of individual block copolymer aggregates (vesicles, micelles, or large compound micelles (LCMs)) are described. The aggregates contain negatively or positively charged corona chains while the PE multilayers conta...
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The manufacture of smaller, faster, more efficient microelectronic components is a major scientific and technological challenge, driven in part by a constant need for smaller lithographically defined features and patterns. Traditional self-assembling approaches based on block copolymer lithography spontaneously yield nanometer-sized hexagonal structures, but these features are not consistent wi...
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ژورنال
عنوان ژورنال: KOBUNSHI RONBUNSHU
سال: 2009
ISSN: 0386-2186,1881-5685
DOI: 10.1295/koron.66.321